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May 2008

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Subject:
From:
Brian Ellis <[log in to unmask]>
Reply To:
TechNet E-Mail Forum <[log in to unmask]>, Brian Ellis <[log in to unmask]>
Date:
Tue, 6 May 2008 09:07:52 +0300
Content-Type:
text/plain
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text/plain (51 lines)
I would say you have a problem. Saponifier usually has, inter alia, two 
components, an amine and a surfactant. The amine, commonly 
monoethanolamine, is ionic and the surfactant is commonly an ethylene 
glycol or similar. The latter has a low vapour pressure and is 
hygroscopic (and this generally applies to all surfactants, even if the 
chemistry family is different. It can also form a matrix which can hold 
the amine in suspension, slowing down iôts evaporation.

The idea of leaving hygroscopic residues is anathema to me. If they are 
mixed with an ionic residue, it is double anathema.

IMHO, and in my experience, saponifier cleaning MUST be followed, not by 
a simple rinse cycle, but by a full wash and rinse cycle, exactly as if 
it were a water-soluble flux.

Brian

- bogert wrote:
> May 5, 2008
> 
> I have the following question:  If a saponifier is used with a DI 
> cleaning machine to clean PWAs and the cleaning does not remove all 
> traces of the saponifier, is there any concern, including sugsequent 
> exposure, to a humid environment?  Any technical reports on this subject?
> 
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