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Date: | Wed, 25 Jul 2007 10:33:32 EDT |
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The throwing power (TP) is defined as the % ratio of copper thickness in the
middle of the hole relative to the entrance of the hole, or the surface.
Always reported in conjunction with aspect ratio. Example: The bath gives 60 %
throw in a 10 :1 aspect ratio hole. This same bath may give 90% throw in a 5:1
aspect ratio hole.
There are 2 main factors that affect the throwing power of the acid copper
bath in a PWB application.
Bath Chemistry
The organic additive package
The proper choice of organic additives is critical.
The key ingredients in the organic additives that affect TP are the Carrier
(suppressor) and the Leveling agent. The carrier increases polarization
resistance and improves copper thickness distribution, by reducing the overall
variability in current density throughout the part. The leveler is more of a
localized suppressor that reacts with the higher current density areas on the
plated part.
The brightener component is the primary grain refiner and has a direct
impact oin the physical properties of the plated copper (tensile strength, %
elongation and also appearance).
The inorganic components
Higher conductivity baths ( low copper and high acid) enhance TP.
Mass Transfer
During plating the copper ion concentration is depleted in the immediate
vicinity of the cathode. This is normally overcome by chemical diffusion. If the
plating rate is much higher than the rate of diffusion additional solution
or part agitation would be needed.
A high aspect ratio hole would require enhanced solution transfer in
conjunction with diffusion. Slower (low current density) plating reduces the rate of
deposition and allows diffusion more time to be a critical factor in mass
transfer.
Solution agitation must be properly designed. This impacts mass transfer
thru the hole as well as the conveying of the leveling agent to the localized
higher current density parts (the entrance and the knee of the hole).
E-ductors, air sparging and part agitation are critical areas that must be optimized.
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