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September 2006

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From:
R Sedlak <[log in to unmask]>
Reply To:
TechNet E-Mail Forum <[log in to unmask]>, R Sedlak <[log in to unmask]>
Date:
Wed, 13 Sep 2006 03:01:04 -0700
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Joe, Wayne, and others...

  A couple of words about ammoniacal etch which might help shed some light on the situation.

  90+% of the pcb fabricators control ammoniacal etch using only density (Baume').

  This was adequate when we called 10 mil line and space "fine lines", but really is not adequate for today's world...

  Think about the fact that Cupric etch has three conditions which are monitored:

  Metal content (By density)
  Acidity (Usually by conductivity)
  Cuprous Content (By ORP)

  If you were going to control ammoniacal with the same precision you would control by the following

  Metal Content (By density)
  pH (Comparable to Acidity in the Cupric etch)
  Cuprous Content (which is controlled by air flow through the chamber)

  So, in many ways the ammoniacal etch today could be considered to be operating on luck.   The system works best when it is used continuously.  The system is pushed to its limits when operated intermittently.

  Rudy Sedlak
  RD Chemical Company


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