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August 2006

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Subject:
From:
"Douglas O. Pauls" <[log in to unmask]>
Reply To:
TechNet E-Mail Forum <[log in to unmask]>, [log in to unmask]
Date:
Tue, 29 Aug 2006 11:33:35 -0500
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Richard,
I think the document you are looking for is HDBK-001.  The original version
of that handbook had specific weak organic acids levels that were
recommended for ion chromatography.  Later versions of the Handbook had
those specific levels taken out, for what reasons I don't know.  You can
also find the values in several papers that I have published in the last 10
years or so.

Doug Pauls
Rockwell Collins




             Richard
             Kraszewski
             <[log in to unmask]                                          To
             COM>                      [log in to unmask]
             Sent by: TechNet                                           cc
             <[log in to unmask]>
                                                                   Subject
                                       [TN] IPC - IC limits for Flux
             08/29/2006 10:58          Residues
             AM


             Please respond to
              TechNet E-Mail
                   Forum
             <[log in to unmask]>
             ; Please respond
                    to
                  Richard
                Kraszewski
             <[log in to unmask]
                   COM>






Does anyone recall an IPC document that implies the limits of weak
organics acid residues that could be left on an assembly?  I think that
it was in the context of IC (ion chromatography).

Seems like I bumped into such a document some time back but I can find
it again.

Thanks in advance.

Rich Kraszewski - KEDS


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