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July 2002

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Subject:
From:
Adam Seychell <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Tue, 23 Jul 2002 00:51:35 -0500
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Well thanks Rudy. So I take it that the major drawback of immersion etching
is not speed but the dreaded etch factor. Could explain why my first etching
system could make tin splinters from undercut of the tin plating resist.
I'll try and get a cross section view under a microscope and see it for my
own eyes.

On Mon, 22 Jul 2002 23:23:47 EDT, Rudy Sedlak <[log in to unmask]> wrote:

>Just realized, that your traces will probably wind up looking like the cross
>section of an aircraft carrier...all deck, and no width at the water level...
>
>Rudy Sedlak
>

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