Hi Russell,

I've run a VCM etcher at upwards of 2 N (our target had always been 1 N) but
we had to - long lead-time on a replacement metering pump and a shorter
delivery date.  The operators asked, "How come we can do it at 2 N all of a
sudden?"  My quick answer was "You've got to pick some number to run it at
and this one minimized process variation" but I'm glad to learn a better
answer.  I'm always learning something new from the list.

Thanks guys!

Hans

Integrity First  -  Service Before Self  -  Excellence in All We Do
~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~
Hans M. Hinners
Electronics Engineer
Warner Robins - Air Logistics Center (WR-ALC/LUGE)
Special Operations Forces System Program Office (SOF - SPO)
Gunship Team
226 Cochran Street
Robins AFB GA 31098-1622

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-----Original Message-----
From: Smith, Russell (US LA) [mailto:[log in to unmask]]
Sent: Wednesday, November 28, 2001 1:15 PM
To: [log in to unmask]
Subject: Re: [TN] Cu CL etcher


----Thanks to everyone for the info , I was a weak on Cupric, (I spent
my life using mostly Ammonium and Ferric, amongst other more exotic
etches)

Any way one more simple or not so simple question :

        Would you run a Cupric etcher @ 140g/l Cu and 5N HCl .?

        Is It a correct assumption that somewhat lower N, and higher
copper would , provide faster etch rate. It just seems to me that
operating at an extreme N will basically just cost money in the form of
excess HCL usage , not to mention the wear and tear on the equipment,
and operators.,


Again thanks for the information!

Russell Smith



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