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Thu, 29 Nov 2001 08:43:16 -0500 |
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Hi Russell,
I've run a VCM etcher at upwards of 2 N (our target had always been 1 N) but
we had to - long lead-time on a replacement metering pump and a shorter
delivery date. The operators asked, "How come we can do it at 2 N all of a
sudden?" My quick answer was "You've got to pick some number to run it at
and this one minimized process variation" but I'm glad to learn a better
answer. I'm always learning something new from the list.
Thanks guys!
Hans
Integrity First - Service Before Self - Excellence in All We Do
~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~
Hans M. Hinners
Electronics Engineer
Warner Robins - Air Logistics Center (WR-ALC/LUGE)
Special Operations Forces System Program Office (SOF - SPO)
Gunship Team
226 Cochran Street
Robins AFB GA 31098-1622
mailto:[log in to unmask]
Com: (478) 926 - 5224
Fax: (478) 926 - 4911
DSN Prefix: 468
-----Original Message-----
From: Smith, Russell (US LA) [mailto:[log in to unmask]]
Sent: Wednesday, November 28, 2001 1:15 PM
To: [log in to unmask]
Subject: Re: [TN] Cu CL etcher
----Thanks to everyone for the info , I was a weak on Cupric, (I spent
my life using mostly Ammonium and Ferric, amongst other more exotic
etches)
Any way one more simple or not so simple question :
Would you run a Cupric etcher @ 140g/l Cu and 5N HCl .?
Is It a correct assumption that somewhat lower N, and higher
copper would , provide faster etch rate. It just seems to me that
operating at an extreme N will basically just cost money in the form of
excess HCL usage , not to mention the wear and tear on the equipment,
and operators.,
Again thanks for the information!
Russell Smith
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