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May 2001

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Subject:
From:
Le Dai Tri <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Fri, 18 May 2001 11:20:06 +0700
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Dear Rudy Sedlak,

I would like to know more about what kind of photoresist stripper
(Alkaline ?) and anti-tarnish ? Do you use both of them in the same
chamber or mixing ? How long can you keep after treatment before
apply AOI ?

TIA,
Tri'.
Fujitsu Vietnam
[log in to unmask]


----- Original Message -----
From: "<Rudy Sedlak>" <[log in to unmask]>
To: <[log in to unmask]>
Sent: Wednesday, May 16, 2001 9:27 PM
Subject: Re: [TN] AOI


> Another way to keep the "false call rates", aka false, or pseudo, defects
> rate down is to use a photoresist stripper with a well formulated
> anti-tarnish system.
>
> It would be interesting to know what the industry considers an acceptable
> norm for false defects in AOI.
>
> I invite interested parties to submit their typical number of false
defects
> to me, (along with the type of AOI device they are using?) and I will try
to
> make a list, and keep an average, and will report it to the group.
>
> Rudy Sedlak
> RD Chemical Company
>
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