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Reply To: | TechNet E-Mail Forum. |
Date: | Wed, 25 Oct 2000 17:14:30 -0700 |
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Greg
Are you talking about removing a resist with an alkaline stripper or
removing a resist for an alkaline etch chemistry? I'm also assuming you are
referring to an innerlayer process, too?
> ----------
> From: triprod.gtriggs[SMTP:[log in to unmask]]
> Reply To: triprod.gtriggs
> Sent: Friday, October 20, 2000 11:22 AM
> To: [log in to unmask]
> Subject: [TN] Stripping of Photoresist
>
> All,
>
> Any thoughts out there regarding the stripping of a alkaline
> etch resist from reverse side treated foil. We seem to be leaving some of
> the adhesion promotion system on the board. Does this cause a problem
> downstream ? Can it be tested for ? How ? We use a stripper based on MEA
> and Choline. Would this be the correct call ? Thank you in advance.
>
> Greg Triggs
> Tritek Circuit Products
>
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