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June 2000

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Subject:
From:
Poh Kong Hui <[log in to unmask]>
Reply To:
TechNet E-Mail Forum.
Date:
Mon, 5 Jun 2000 21:38:17 +0800
Content-Type:
text/plain
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text/plain (32 lines)
Hi Again,

In the previous Email, I did not make myself clear for everyone
to understand what I meant 'to quanify flux residue'.

In fact, I am looking for way to measure & quantify the flux
residue that left after wave soldering process, using no-clean
flux.

I understand using clean process, ionic contamination is one of
the way of measuring the residue, however, it is mainly for clean
process.

Please advise me. Thanks you.


Poh

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