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1996

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Subject:
Photoresist developing
From:
<[log in to unmask]>
Date:
Wed, 3 Jul 1996 16:45:25 +0400 (EDT)
Content-Type:
TEXT/PLAIN
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TEXT/PLAIN (17 lines) 
Our process engineer for developing and I have been discussing ways to 
improve that process.  He wants to see if developing solution pH can be 
used to set developer speed.  Is this possible? Anyone else doing this?  
We also are looking for ways to use SPC to improve in this process.  
Anyone want to work with us or discuss this?

Lou Hart    Quality Assurance   Compunetics 412-858-6117


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