[log in to unmask] wrote:
> 
> HI
> 
> I know that some of you out there are having excellant results using the Morton
> MX series photo resist for pattern plating.  I am experimenting with this
> material and I to have resolved some remarkably small and difficult patterns.
> 
> But I need some advise that the Morton rep's can't seem to give me.  How do you
> guys strip this stuff.  I use Alkastrip AQI in my stripper (Monoethanolamine) at
> 7% at 120 F. for the regular resist.  I have tried raising the concentration to
> 10% and the temperature up to 132 F. and there is still resist.  I tried 5 %
> NaOH at 125 F., this improved the situation but there is still some residual
> resist on these panels.
> 
> I will appreciate any thoughts.  Thanks in advance.
> 
> Chuck Brummer
> Acuson
> (818) 734-4930
> [log in to unmask]
Dear Chuck:

Not sure if I can help regarding the specific dry film you are using,
but what is your cleaning process prior to resist lam?  Do you have any
problems developing this film?  Lastly, what environment is the resist
exposed to after developing prior to resist stripping?

Ted Stern

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