Subject: | |
From: | |
Date: | Wed, 5 Jun 96 8:06:19 PDT |
Content-Type: | text/plain |
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Michael Martinez <[log in to unmask]> Wrote:
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| Hello All those in Technet,
|
| I am in dire need of information concerning gold plating
| specifications. I am researching two processes gold
| flash and gold
| plating and would like to know if there are any articles
| or sources
| that will shed any light to these two different
| processes. I do know
| that gold flash is a less expensive approach than
| plating, but I would
| like to know all draw backs to it. Any information will
| be greatly
| appreciated.
|
| Thanks,
| Mike
|
| [log in to unmask]
|
Mike:
MIL-G-45204 is a good spec for gold flash (immersion gold) and QQ-N-290 is
a good spec for underlying Ni layer (eletroless Ni). IPC-2221 (working
version) is a good reference for Ni layer thickness. The advantage of
this technology is better coplanary and anti-corrosion. The draw back
will be solderability, shelf life, Au porosity, P content (8-10% is the
upper limit) in Ni and strength of intermetallics. It is know that Au-Sn
intermetallics is weaker than Cu-Sn intermetallics.
Some good readings are *Effect of Aging on the Strength and Ductility of
Controlled Collapse Solder Joints" by K. Banerji and R. Darveaux of
Motorola , *Materials Developments in Microelectronics Packaging:
Performance and Reliability* by D.R. Frear, f.M. Hosking and P.T. Vianco
of Sandia National Lab, *Microstructure of Electroless Nickel-Solder
Interactions by V.F. Hribar, J.L. Bauer, and T.P. O'Donnell from
California Institute of Technology.
Nora
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