HI
I know that some of you out there are having excellant results using the Morton
MX series photo resist for pattern plating. I am experimenting with this
material and I to have resolved some remarkably small and difficult patterns.
But I need some advise that the Morton rep's can't seem to give me. How do you
guys strip this stuff. I use Alkastrip AQI in my stripper (Monoethanolamine) at
7% at 120 F. for the regular resist. I have tried raising the concentration to
10% and the temperature up to 132 F. and there is still resist. I tried 5 %
NaOH at 125 F., this improved the situation but there is still some residual
resist on these panels.
I will appreciate any thoughts. Thanks in advance.
Chuck Brummer
Acuson
(818) 734-4930
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