Dear Scott:

What type of photoresist are you using and is the application spray or
immersion?  Resist strippers "strip" by breaking both intramolecular
resist bonds and resist-copper bonds.  It is the rate of simultaneous
attack on both bonding systems that determines the partical size of the
stripped resist. There are other factors such as spray pressure and
temperature which influence partical size as well, but the above bonding
mechanisms have the most influence.  This is one reason chemical
suppliers have such long lists of resist strippers available.

If your photoresist supplier offers chemistry, I would be inclined to
begin with those products first.  Be sure to specify the filtration
method employed and partical size you would like to see.  Also be
advised that laboratory beaker testing is not an adequate method to
evaluate the performance of a resist stripper.

If you have additional questions, please feel free to call me.

Regards,
Ted Stern
phone: 612-479-6525

Scott B. Westheimer wrote:
>
> We are using a liquid photo resist and have tried many strippers
> without being able to get a filterable particle size. Either the film
> completely dissolves or comes off in sheets. I am told that this is
> common with this type of film. Any suggestions?
>
> Scott

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