Does anyone have information, opinions or preferably data regarding micro 
etching with persulfate vs sulfuric acid/peroxide chemistries? We are 
currently using a sulfuric acid/peroxide based microetch at the HAL line, and 
are considering alternatives. I have seen some information which suggests a 
persulfate based chemistry is better at removing solder mask residues.  Any 
feedback would be appreciated.

Jim Kenny

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