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Reply To: | TechNet E-Mail Forum. |
Date: | Tue, 23 Jun 1998 12:57:10 PST |
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Holly,
You may also consider adding the following to your list :
The elimination of Chlorine gas .
The elimination of Silver Halide imaging film ( as a result of
Laser Imaging .
Improved filtration of photoresist material during the stripping
process .
Mike Covel
Raytheon Systems Company
Tucson Az.
______________________________ Reply Separator _________________________________
Subject: [TN] switch from chromic-based etchants
Author: "TechNet E-Mail Forum." <[log in to unmask]>, at CCGATE
Date: 6/22/98 11:31 AM
Dear Technetters:
I am writing a journal article on the environmental improvements the
industry has made over the past 20 years. My list includes:
- reduced use of tin-lead as etch resist
- increased use of HASL alternatives
- increased use of direct metallization
- elimination of chlorinated solvents
- switch from chromic-based etchants
If any of you have any insight into the <underline>technical</underline>
reasons, the industry adopted these improvements, I would greatly
appreciate your insight and help (I really need help on the chromic acid
section). You can respond to me directly through my e-mail address
([log in to unmask]).
Thank you in advance.
Holly Evans
Director of Environmental and Safety Programs
IPC
1400 Eye St., N.W., Suite 540
Washington, D.C. 20005-2208
phone: 202-638-6219
fax: 202-638-0145
e-mail: [log in to unmask]
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